Impurity engineering of Czochralski silicon: effects of germanium-doping
نویسندگان
چکیده
منابع مشابه
Defect Engineering During Czochralski Crystal Growth and Silicon Wafer Manufacturing
Single crystal silicon has played the fundamental role in electronic industry since the second half of the 20th century and still remains the most widely used material. Electronic devices and integrated circuits are fabricated on single-crystal silicon wafers which are produced from silicon crystals grown primarily by the Czochralski (CZ) technique. Various defects are formed in the growing cry...
متن کاملEffect of tin doping on oxygen- and carbon-related defects in Czochralski silicon
Experimental and theoretical techniques are used to investigate the impact of tin doping on the formation and the thermal stability of oxygenand carbon-related defects in electron-irradiated Czochralski silicon. The results verify previous reports that Sn doping reduces the formation of the VO defect and suppresses its conversion to the VO2 defect. Within experimental accuracy, a small delay in...
متن کاملReduced microwave attenuation in coplanar waveguides using deep level impurity compensated Czochralski-silicon substrates
We show that deep level doping of Czochralski-grown silicon wafers is capable of providing high resistivity handle wafers suitable for radio frequency integrated circuits. Starting from n-type Czochralski silicon wafers having a nominal resistivity of 50 cm, we use ion implantation and subsequent annealing to increase the resistivity of the wafers to over 10 k cm at room temperature. Coplanar w...
متن کاملThree-dimensional numerical simulation of temperature and flow fields in a Czochralski growth of germanium
For a Czochralski growth of Ge crystal, thermal fields have been analysed numerically using the three-dimensional finite volume method (FLUENT package). The arrangement used in a real Czochralski crystal growth lab included a graphite crucible, heat shield, heating device, thermal insulation and chamber including two gas outlets. We have considered two cases for calculations, which are configur...
متن کاملNumerical Modeling of Czochralski Silicon Crystal Growth
Modeling of heat transfer is presented for the entire Czochralski Si-growth furnace. The axisymmetric steady-state approach with moving computational grids is used. Melt turbulent flow, inert gas flow, heat transfer in solid parts, and radiative heat transfer in the system are considered. The Reynolds-averaged Navier-Stokes equations written with the Boussinesq approximation and the energy equa...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: SCIENTIA SINICA Informationis
سال: 2019
ISSN: 1674-7267
DOI: 10.1360/n112018-00146